Furnace Tubes And Accessories

Semiconductor furnace tube(such as those used in diffusion furnaces, oxidation furnaces, etc.) must meet strict requirements such as ultra-high purity, high temperature stability, and thermal shock resistance. RSiC furnace tube has become a mainstream material due to its excellent properties. The purity of the sintered body is above 3N, and the processing accuracy is 0.01mm.

Furnace chamber insulation barrel is a key thermal field component used in semiconductor manufacturing processes such as monocrystalline silicon growth and wafer heat treatment. Insulation barrel must meet the requirements of extreme high temperature, high purity, and excellent thermal insulation。

Furnace thermal shield plate is the core components of high-temperature semiconductor, photovoltaic. RSiC thermal shield plate new material sintering equipment. RSiC thermal shield plate has the characteristics of high temperature resistance, low heat loss, and long service life.

Recrystallized silicon carbide cantilever paddle is a high-performance ceramic component, mainly used in industries such as chemical, metallurgical, environmental protection, and semiconductor due to its superior high temperature resistance, corrosion resistance, wear resistance, and good thermal shock stability.

RSiC furnace tube:Recrystallized silicon carbide furnace tube is a key component in semiconductor manufacturing equipment, mainly used in high-temperature process chambers (such as epitaxial growth, ion implantation, diffusion furnace, etc.). The sintered body purity is above 3N, and the processing accuracy can reach 0.01mm, meeting the requirements of ultra-high purity, corrosion resistance, and precision size.